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Plasma-Enhanced CVD Synthesis and Structural Characterization of Ta2N3.

โœ Scribed by Alexei Yu. Ganin; Lorenz Kienle; Grigori V. Vajenine


Publisher
John Wiley and Sons
Year
2004
Weight
12 KB
Volume
35
Category
Article
ISSN
0931-7597

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โœฆ Synopsis


Abstract

For Abstract see ChemInform Abstract in Full Text.


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Fluorine mediated crystal silicon thin films in plasmaโ€enhanced chemical vapor deposition were grown using a Si~2~H~6~ and SiF~4~ gas mixture without an intentional hydrogen dilution. The crystal growth took place at the temperatures above 400ยฐC, and both crystallinity and growth rate were increased