𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Synthesis of Al2O3–SiO2 Films by Ar/O2 Plasma-Enhanced CVD from Alkoxide Precursors

✍ Scribed by Y. Li; S. Shimada; A. Hirose


Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
445 KB
Volume
12
Category
Article
ISSN
0948-1907

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Low-Temperature ALE Deposition of Y2O3 T
✍ M. Putkonen; T. Sajavaara; L.-S. Johansson; L. Niinistö 📂 Article 📅 2001 🏛 John Wiley and Sons 🌐 English ⚖ 461 KB 👁 1 views

Yttrium oxide thin film deposition by atomic layer epitaxy (ALE) was studied at 200±425 C using Y(thd) 3 , Y(thd) 3 (bipyridyl), or Y(thd) 3 (1,10-phenanthroline) (thd = 2,2,6,6-tetramethyl-3,5-heptanedione) as an yttrium precursor, and ozone as an oxygen source. All yttrium precursors were analyzed

Epitaxial Growth of Bi4Ti3O12 on α-Al2O3
✍ M. Schuisky; R. Skoog; A. Hårsta 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 398 KB

gas was ultrahigh purity (UHP) argon. UHP oxygen, saturated with deionized H 2 O, served as the oxidant. The introduction of H 2 O was necessary to avoid the formation of BaF 2 as an impurity phase. Typical processing conditions for this study are summarized in Table . Table 1. Typical processing co

Investigation of plasma interaction with
✍ Doz. Dr. H.-J. Tiller; Dr. F.-W. Breitbarth; Dipl.-Chem. B. Langguth; Dipl. Phys 📂 Article 📅 1981 🏛 John Wiley and Sons 🌐 English ⚖ 368 KB 👁 1 views

Carbon impurities on highly disperse SiO, and AhO, are detected by their interaction with low pressure plasmas, with aid of mass-, emissionand epr-spectroscopic methods. The formation of surface defects on SiO, by plasma treatment is strongly influenced by these impurities. Some of these defects are