Low Dielectric Constant SiO2:C,F Films Prepared from Si(OC2H5)4/C4F8/Ar by Plasma-Enhanced CVD

✍ Scribed by S.-J. Ding; D. W. Zhang; J.-T. Wang; W. W. Lee

• Publisher: John Wiley and Sons
• Year: 2001
• Tongue: English
• Weight: 363 KB
• Volume: 7
• Category: Article
• ISSN: 0948-1907
• DOI: 10.1002/1521-3862(200107)7:4<142::aid-cvde142>3.0.co;2-c