Plasma enhanced chemical vapour deposition of silica thin films in an integrated distributed electron cyclotron resonance reactor

✍ Scribed by P Bulkin; N Bertrand; B Drévillon; J.C Rostaing; F Delmotte; M.C Hugon; B Agius

• Book ID: 114086246
• Publisher: Elsevier Science
• Year: 1997
• Tongue: English
• Weight: 138 KB
• Volume: 308-309
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/s0040-6090(97)00539-7