Deposition of Ge-doped silica thin films for an integrated optic application using a matrix distributed electron cyclotron resonance PECVD reactor

✍ Scribed by Roelene Botha; Pavel V. Bulkin; Pieter L. Swart

• Publisher: Elsevier Science
• Year: 2007
• Tongue: English
• Weight: 207 KB
• Volume: 30
• Category: Article
• ISSN: 0925-3467
• DOI: 10.1016/j.optmat.2006.11.055