✦ LIBER ✦

Electron cyclotron resonance (ECR) plasma-enhanced chemical vapour deposition of silicon dioxide on strained-SiGe films using tetraethylorthosilicate

✍ Scribed by L K Bera; S K Ray; H D Banerjee; C K Maiti

Book ID: 110659506
Publisher: Springer-Verlag
Year: 1998
Tongue: English
Weight: 275 KB
Volume: 21
Category: Article
ISSN: 0250-4707
DOI: 10.1007/bf02744953

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Wet etching studies of silicon nitride t

Wet etching studies of silicon nitride thin films deposited by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition

✍ K.B. Sundaram; R.E. Sah; H. Baumann; K. Balachandran; R.M. Todi 📂 Article 📅 2003 🏛 Elsevier Science 🌐 English ⚖ 194 KB

Silicon nitride films of various compositions have been deposited on silicon substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) technique from mixtures of Ar, N and SiH as precursors. Film 2 4 composition and refractive index as a function of deposition p

Plasma-enhanced chemical vapour depositi

Plasma-enhanced chemical vapour deposition of fluorinated silicon dioxide films using novel alkylsilanes

✍ Ravi K. Laxman; Arthur K. Hochberg; David A. Roberts; Raymond N. Vrtis; Saul Ova 📂 Article 📅 1996 🏛 John Wiley and Sons 🌐 English ⚖ 530 KB

Deposition processes and film properties of plasma-enhanced chemical vapour deposition (PECVD) films derived from fluoroalkylsilanes are described. The fluorinated silicon dioxide (FSG) films have lower dielectric constants (3.3-3.7) than non-fluorinated silicon dioxide films (>4). With similar diel

Electron cyclotron resonance plasma enha

Electron cyclotron resonance plasma enhanced chemical vapour deposition and optical properties of SiOx thin films

✍ Pavel V Bulkin; Pieter L Swart; Beatrys M Lacquet 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 216 KB

In-situ monitoring of electron cyclotron

In-situ monitoring of electron cyclotron resonance plasma chemical vapour deposition of hydrogenated silicon nitride films

✍ Mohamed Boumerzoug; Roman V. Kruzelecky; Peter Mascher; David A. Thompson 📂 Article 📅 1993 🏛 Elsevier Science 🌐 English ⚖ 472 KB

Physical and electrical analysis of sili

Physical and electrical analysis of silicon dioxide thin films produced by electron-cyclotron resonance chemical-vapour deposition

✍ D. Landheer; L.-Å. Ragnarsson; S. Belkouch 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 685 KB

High-quality silicon dioxide films have been deposited in the temperature range 150-425 °C by electron-cyclotron resonance chemical-vapour deposition (ECR-CVD) using an oxygen plasma with silane introduced downstream. The interface state densities of 10 nm thick films measured by the high-low freque

Plasma enhanced chemical vapour depositi

Plasma enhanced chemical vapour deposition of silica thin films in an integrated distributed electron cyclotron resonance reactor

✍ P Bulkin; N Bertrand; B Drévillon; J.C Rostaing; F Delmotte; M.C Hugon; B Agius 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 138 KB