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Plasma-Enhanced Atomic Layer Deposition of TaN Thin Films Using Tantalum-Pentafluoride and N[sub 2]∕H[sub 2]∕Ar Plasma

✍ Scribed by Chung, Hoi-Sung; Kwon, Jung-Dae; Kang, Sang-Won


Book ID
118264769
Publisher
The Electrochemical Society
Year
2006
Tongue
English
Weight
169 KB
Volume
153
Category
Article
ISSN
0013-4651

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