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Plasma chemistries for high density plasma etching of SiC

✍ Scribed by J. Hong; R. J. Shul; L. Zhang; L. F. Lester; H. Cho; Y. B. Hahn; D. C. Hays; K. B. Jung; S. J. Pearton; C. -M. Zetterling; M. Östling

Book ID
107457835
Publisher
Springer US
Year
1999
Tongue
English
Weight
364 KB
Volume
28
Category
Article
ISSN
0361-5235

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