Control of high-density plasma sources for CVD and etching

✍ Scribed by K Suzuki; H Sugai; K Nakamura; TH Ahn; M Nagatsu

• Book ID: 104265900
• Publisher: Elsevier Science
• Year: 1997
• Tongue: English
• Weight: 734 KB
• Volume: 48
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/s0042-207x(97)00054-7

✦ Synopsis

Large-diameter high-density plasmas such as ECR, he/icon-, inductively-coupled, and surface-wave plasmas have been developed for thin film technologies in the next generation. Applications of such high density plasmas to etching and CVDprocesses require deeper understanding of discharge physics as well as advanced plasma control. In this paper, new findings of antenna-plasma coupling processes in a he/icon rf discharge (resonant directional wave excitation) and in a microwave discharge (standing surface-wave excitation) are described. In addition, an internal antenna system of inductive t-f discharges for production of a large-area plasma is presented.