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Low temperature etching of Si and PR in high density plasmas

✍ Scribed by M. Puech; Ph. Maquin

Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 341 KB
Volume: 100-101
Category: Article
ISSN: 0169-4332
DOI: 10.1016/0169-4332(96)00342-x

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