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Low temperature etching of Si in high density plasma using SF6/O2

✍ Scribed by Johann W. Bartha; Johann Greschner; M. Puech; P. Maquin

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 465 KB
Volume: 27
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(94)00144-j

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