✦ LIBER ✦

Nanometer scale linewidth control during etching of polysilicon gates in high-density plasmas

✍ Scribed by O Joubert; E Pargon; J Foucher; X Detter; G Cunge; L Vallier

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Two-dimensional simulation of polysilico

✍ Lymberopoulos, D.P.; Economou, D.J. 📂 Article 📅 1995 🏛 IEEE 🌐 English ⚖ 910 KB

Influence of the nature of the mask on p

✍ F.H. Bell; O. Joubert; L. Vallier 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 727 KB

Power dependence of gate oxide damage fr

✍ K Hashimoto; F Shimpuku; A Hasegawa; Y Hikosaka; M Nakamura 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 170 KB

A study of the role of HBr and oxygen on

✍ Deok-kee Kim; Young Keun Kim; Heon Lee 📂 Article 📅 2007 🏛 Elsevier Science 🌐 English ⚖ 534 KB