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Influence of the nature of the mask on polysilicon gate patterning in high density plasmas

✍ Scribed by F.H. Bell; O. Joubert; L. Vallier


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
727 KB
Volume
30
Category
Article
ISSN
0167-9317

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The effect of backward masking with illumination of all fields or with a checkerboard pattern, respectively, on the recognition of pattern + or T was measured on four groups of subjects: 21 presenile onset DAT patients, 16 patients with a questionable vascular dementia of the same age (CVD group), 1