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The fabrication of back-gated high electron mobility transistors — a novel approach using MBE regrowth on an in situ ion beam patterned epilayer

✍ Scribed by E.H. Linfield; G.A.C. Jones; D.A. Ritchie; A.R. Hamilton; N. Iredale


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
459 KB
Volume
127
Category
Article
ISSN
0022-0248

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