✦ LIBER ✦
A study of the role of HBr and oxygen on the etch selectivity and the post-etch profile in a polysilicon/oxide etch using HBr/O2 based high density plasma for advanced DRAMs
✍ Scribed by Deok-kee Kim; Young Keun Kim; Heon Lee
- Publisher
- Elsevier Science
- Year
- 2007
- Tongue
- English
- Weight
- 534 KB
- Volume
- 10
- Category
- Article
- ISSN
- 1369-8001
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