✦ LIBER ✦
High density fluorocarbon plasma etching of new resists suitable for nano-imprint lithography
✍ Scribed by F. Gaboriau; M.C. Peignon; A. Barreau; G. Turban; Ch. Cardinaud; K. Pfeiffer; G. Bleidießel; G. Grützner
- Book ID
- 108411120
- Publisher
- Elsevier Science
- Year
- 2000
- Tongue
- English
- Weight
- 667 KB
- Volume
- 53
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.