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Carbon etching with a high density plasma etcher

โœ Scribed by Kevin A. Pears; Jens Stolze


Book ID
108207435
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
483 KB
Volume
81
Category
Article
ISSN
0167-9317

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Control of high-density plasma sources f
โœ K Suzuki; H Sugai; K Nakamura; TH Ahn; M Nagatsu ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 734 KB

Large-diameter high-density plasmas such as ECR, he/icon-, inductively-coupled, and surface-wave plasmas have been developed for thin film technologies in the next generation. Applications of such high density plasmas to etching and CVDprocesses require deeper understanding of discharge physics as w