✦ LIBER ✦

Comparison of F2plasma chemistries for deep etching of SiC

✍ Scribed by P. Leerungnawarat; K. P. Lee; S. J. Pearton; F. Ren; S. N. G. Chu

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Plasma chemistries for high density plas

✍ J. Hong; R. J. Shul; L. Zhang; L. F. Lester; H. Cho; Y. B. Hahn; D. C. Hays; K. 📂 Article 📅 1999 🏛 Springer US 🌐 English ⚖ 364 KB

Dry etching of SrBi2Ta2O9: Comparison of

✍ Jin Su Park; Tae Hee Kim; Chang Sun Choi; Yoon-Bong Hahn 📂 Article 📅 2002 🏛 Springer US 🌐 English ⚖ 696 KB

Plasma chemistries for dry etching of Ni

✍ K. B. Jung; J. Hong; H. Cho; J. R. Childress; S. J. Pearton; M. Jenson; A. T. Hu 📂 Article 📅 1998 🏛 Springer US 🌐 English ⚖ 254 KB

Reactive ion etching of SiC using C2F6/O

✍ S. -M. Kong; H. -J. Choi; B. -T. Lee; S. -Y. Han; J. L. Lee 📂 Article 📅 2002 🏛 Springer US 🌐 English ⚖ 149 KB

Effect of Plasma and Control Parameters

✍ Byungwhan Kim; Byung-Teak Lee 📂 Article 📅 2003 🏛 Springer 🌐 English ⚖ 248 KB

Inductively coupled plasma etching of II

✍ J.W Lee; E.S Lambers; C.R Abernathy; S.J Pearton; R.J Shul; F Ren; W.S Hobson; C 📂 Article 📅 1998 🏛 Elsevier Science 🌐 English ⚖ 881 KB