𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Phase shift mask making by e-beam lithography

✍ Scribed by H. Elsner; P. Hahmann

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
439 KB
Volume
21
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

Electron beam lithography simulation for
Electron beam lithography simulation for mask making
✍ Chris A. Mack πŸ“‚ Article πŸ“… 1999 πŸ› Elsevier Science 🌐 English βš– 589 KB

A new model called ProBEAM/3D is introduced for the simulation of electron beam lithography and applied to the problem of mask making. Monte Carlo simulations are combined with a beam shape to generate a single "pixel" energy distribution. This pixel is then used to write a pattern by controlling th