✦ LIBER ✦
Phase-shifting mask and top imaging resist for sub-half micron deep-UV lithography
✍ Scribed by O. Joubert; B. Dal'zotto; B. Picard; A. Sahm; S. Tedesco
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 319 KB
- Volume
- 17
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.