𝔖 Bobbio Scriptorium
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Electron beam lithography simulation for mask making

✍ Scribed by Chris A. Mack

Publisher
Elsevier Science
Year
1999
Tongue
English
Weight
589 KB
Volume
46
Category
Article
ISSN
0167-9317

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✦ Synopsis

A new model called ProBEAM/3D is introduced for the simulation of electron beam lithography and applied to the problem of mask making. Monte Carlo simulations are combined with a beam shape to generate a single "pixel" energy distribution. This pixel is then used to write a pattern by controlling the dose of every pixel on an address grid. The resulting dose pattern is used to expose and develop a resist to form a simulated three-dimensional resist pattern.

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