๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

LITHOS: A fast electron beam lithography simulator

โœ Scribed by N. Glezos; I. Raptis; M. Hatzakis

Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
512 KB
Volume
26
Category
Article
ISSN
0167-9317

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Electron beam lithography simulation for
Electron beam lithography simulation for mask making
โœ Chris A. Mack ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 589 KB

A new model called ProBEAM/3D is introduced for the simulation of electron beam lithography and applied to the problem of mask making. Monte Carlo simulations are combined with a beam shape to generate a single "pixel" energy distribution. This pixel is then used to write a pattern by controlling th

Electron-beam lithography resist profile
Electron-beam lithography resist profile simulation for highly sensitive resist
โœ C. Lee; Y.M. Ham; S.H. Kim; K. Chun ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 287 KB

A very highly sensitive resist is difficult to simulate its resist profile because of its extreme difference of development rate which can be determined from absorbed energy when electron beam is exposed. We developed resist profile simulator named ELlS (Electron-beam Lithography Simulator) that can

Fast electron beam simulation and dose c
Fast electron beam simulation and dose calculation in radiotherapy
โœ A. Trindade; P. Rodrigues; L. Peralta; M.C. Lopes; C. Alves; A. Chaves ๐Ÿ“‚ Article ๐Ÿ“… 2004 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 588 KB

A flexible multiple source model capable of fast reconstruction of clinical electron beams is presented in this paper. A source model considers multiple virtual sources emulating the effect of the accelerator head components. A reference configuration (10 MeV and 10 ร‚ 10 cm 2 field size) for a Sieme