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Masked ion beam lithography for proximity printing

✍ Scribed by E. Hammel; H. Löschner; G. Stengl; H. Buschbeck; A. Chalupka; H. Vonach; E. Cekan; W. Fallmann; F. Paschke; G. Stangl

Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 401 KB
Volume: 30
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(95)00236-7

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