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The electron beam proximity printing lithography, a candidate for the 0.35 and 0.25 micron chip generations

✍ Scribed by U. Behringer; W. Haug; K. Meissner; W. Ziemlich; H. Bohlen; T. Bayer; W. Kulcke; H. Rothuizen; G. Sasso; P. Vettiger


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
489 KB
Volume
13
Category
Article
ISSN
0167-9317

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