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Computer aided proximity correction for direct write E-beam lithography

โœ Scribed by E. Knapek; C.K. Kalus; M. Madore; M. Hintermaier; U. Hofmann; H. Scherer-Winner; R. Schlager


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
377 KB
Volume
13
Category
Article
ISSN
0167-9317

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