✦ LIBER ✦
Pattern partitioning for enhanced proximity-effect corrections in electron-beam lithography: Mihir Parikh and Donald E. Schreiber. IBM J. Res. Devel. 24 (5), 530 (September 1980)
- Publisher
- Elsevier Science
- Year
- 1981
- Tongue
- English
- Weight
- 113 KB
- Volume
- 21
- Category
- Article
- ISSN
- 0026-2714
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