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Computational algorithms for optimizing mask layouts in proximity printing

โœ Scribed by K. Motzek; U. Vogler; M. Hennemeyer; M. Hornung; R. Voelkel; A. Erdmann; B. Meliorisz

Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
613 KB
Volume
88
Category
Article
ISSN
0167-9317

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Based on numerical simulations, we show the influence of the illumination on process windows in mask aligner lithography. The precise shaping of the illuminating light can lead to greatly increased process windows. We show that the best results are obtained when combining an optimized illumination w