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The selection of processing conditions for e-beam resists in mask making

✍ Scribed by VK Sharma; MJ Wheeler

Publisher: Elsevier Science
Year: 1985
Tongue: English
Weight: 597 KB
Volume: 3
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(85)90041-3

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