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Desorption process of Ga atoms from the mask surface in selective area growth of GaAs by electron-cyclotron-resonance plasma-excited molecular-beam epitaxy (ECR-MBE)

โœ Scribed by Norio Yamamoto; Naoto Kondo; Yasushi Nanishi


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
246 KB
Volume
108
Category
Article
ISSN
0022-0248

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