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Development of a fast and high resolution e-beam process for the fabrication of X-ray masks with CD of 0.15 μm

✍ Scribed by I. Raptis; M. Gentili; E. Di Fabrizio; R. Maggiora; M. Baciocchi; L. Grella; L. Mastrogiacomo


Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
823 KB
Volume
27
Category
Article
ISSN
0167-9317

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