In the present work an analysis of the thermal conditions during silicon carbide crystal growth from the vapour phase by the sublimation method is carried out. On the basis of the obtained results from the calculation of the temperature distribution along the length of the growing crystal it was dra
Peculiarities of Silicon Carbide Crystal Growth in Quasiclosed Volume
β Scribed by Dr. S. K. Lilov
- Publisher
- John Wiley and Sons
- Year
- 1993
- Tongue
- English
- Weight
- 309 KB
- Volume
- 28
- Category
- Article
- ISSN
- 0232-1300
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β¦ Synopsis
On the basis of the accomplished investigation is has been shown that in the known schemes for growing of Sic epitaxial layers from the gas phase in quasiclosed volume it takes place an excretion of the redundant silicon upon the front of crystallization, its accumulation in the gas phase up to the state of the saturation and its deposition upon the growing surface as drops. In this case the growth of the epitaxial layer takes place by the vapour-liquid-solid (VLS) mechanism.
π SIMILAR VOLUMES
Investigation of the thermal etching (evaporation) of the source material in the process of silicon carbide crystal growth from the vapour phase by the sublimation method has been carried out. It has been established that silicon carbide etching in the temperature interval (2200-2600) "C takes place
The dependence of the growth rate of Sic crystals on the diameter of the graphite crystallization sleeve (GCS) forming the crystal growth zone has been investigated. It has been established that at a given crucible construction there is an exactly determined diameter of (GCS) for growing of Sic crys