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Peculiarities of Silicon Carbide Crystal Growth in Quasiclosed Volume

✍ Scribed by Dr. S. K. Lilov


Publisher
John Wiley and Sons
Year
1993
Tongue
English
Weight
309 KB
Volume
28
Category
Article
ISSN
0232-1300

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✦ Synopsis


On the basis of the accomplished investigation is has been shown that in the known schemes for growing of Sic epitaxial layers from the gas phase in quasiclosed volume it takes place an excretion of the redundant silicon upon the front of crystallization, its accumulation in the gas phase up to the state of the saturation and its deposition upon the growing surface as drops. In this case the growth of the epitaxial layer takes place by the vapour-liquid-solid (VLS) mechanism.


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