The dependence of the growth rate of Sic crystals on the diameter of the graphite crystallization sleeve (GCS) forming the crystal growth zone has been investigated. It has been established that at a given crucible construction there is an exactly determined diameter of (GCS) for growing of Sic crys
Investigation of the thermal conditions during silicon carbide crystal growth
โ Scribed by Dr. S. K. Lilov
- Publisher
- John Wiley and Sons
- Year
- 1994
- Tongue
- English
- Weight
- 322 KB
- Volume
- 29
- Category
- Article
- ISSN
- 0232-1300
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โฆ Synopsis
In the present work an analysis of the thermal conditions during silicon carbide crystal growth from the vapour phase by the sublimation method is carried out. On the basis of the obtained results from the calculation of the temperature distribution along the length of the growing crystal it was drawn a conclusion that in order to decrease the density of dislocations in the growing crystals it is necessary to decrease the temperature gradients in the crucible for growing.
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๐ SIMILAR VOLUMES
Investigation of the thermal etching (evaporation) of the source material in the process of silicon carbide crystal growth from the vapour phase by the sublimation method has been carried out. It has been established that silicon carbide etching in the temperature interval (2200-2600) "C takes place