A closed UHV focused ion beam patterning
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H. Muessig; Th. Hackbarth; H. Brugger; A. Orth; J.P. Reithmaier; A. Forchel
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Article
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1995
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Elsevier Science
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English
β 556 KB
An in situ ultra-high vacuum processing technique using a direct-write focused ion beam (FIB) implantation in combination with an epitaxial regrowth by molecular beam epitaxy (MBE) is reported. The process is suitable for the realization of buried confinement structures and current blocking layers i