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Patterning of amorphous and polycrystalline Ni78B14Si8 with a focused-ion-beam

✍ Scribed by Wuxia Li; Roussi Minev; Stefan Dimov; Georgi Lalev


Book ID
108060139
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
754 KB
Volume
253
Category
Article
ISSN
0169-4332

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An in situ ultra-high vacuum processing technique using a direct-write focused ion beam (FIB) implantation in combination with an epitaxial regrowth by molecular beam epitaxy (MBE) is reported. The process is suitable for the realization of buried confinement structures and current blocking layers i