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Exploration of the ultimate patterning potential achievable with focused ion beams

✍ Scribed by J. Gierak; E. Bourhis; G. Faini; G. Patriarche; A. Madouri; R. Jede; L. Bruchhaus; S. Bauerdick; B. Schiedt; A.L. Biance; L. Auvray

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