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Patterning capability of new molecular resist in EUV lithography

✍ Scribed by Hiroaki Oizumi; Yuusuke Tanaka; Takaaki Kumise; Daiju Shiono; Taku Hirayama; Hideo Hada; Junichi Onodera; Atsuko Yamaguchi; Iwao Nishiyama

Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
692 KB
Volume
84
Category
Article
ISSN
0167-9317

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πŸ“œ SIMILAR VOLUMES

Performance of molecular resist based on
Performance of molecular resist based on polyphenol in EUV lithography
✍ Hiroaki Oizumi; Fumiaki Kumasaka; Yuusuke Tanaka; Taku Hirayama; Daiju Shiono; H πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 511 KB

This study examined the ultimate fine-pitch patterning performance in EUV lithography (EUVL) of a chemically amplified (CA) positive-tone resist based on low-molecular-weight amorphous polyphenol. This advanced resist is composed of the low-molecular-weight protected polyphenol 4,4 0 -methylenebis[2