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Examination of the solubility and the molecular weight distribution of PMMA in view of an optimised resist system in deep etch x-ray lithography

✍ Scribed by A. El-Kholi; P. Bley; J. Göttert; J. Mohr


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
276 KB
Volume
21
Category
Article
ISSN
0167-9317

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