Estimation of resist profile for line/space patterns using layer-based exposure modeling in electron-beam lithography

✍ Scribed by Q. Dai; S.-Y. Lee; S.H. Lee; B.-G. Kim; H.-K. Cho

• Publisher: Elsevier Science
• Year: 2011
• Tongue: English
• Weight: 661 KB
• Volume: 88
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2010.12.012