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Passivation Properties of Atomic-Layer-Deposited Hafnium and Aluminum Oxides on Si Surfaces

✍ Scribed by Jun Wang; Mottaghian, S.S.; Baroughi, M.F.

Book ID: 114620814
Publisher: IEEE
Year: 2012
Tongue: English
Weight: 467 KB
Volume: 59
Category: Article
ISSN: 0018-9383
DOI: 10.1109/ted.2011.2176943

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