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Atomic Layer Deposition and Properties of Lanthanum Oxide and Lanthanum-Aluminum Oxide Films

✍ Scribed by K. Kukli; M. Ritala; V. Pore; M. Leskelä; T. Sajavaara; R. I. Hegde; D. C. Gilmer; P. J. Tobin; A. C. Jones; H. C. Aspinall


Publisher
John Wiley and Sons
Year
2006
Tongue
English
Weight
447 KB
Volume
12
Category
Article
ISSN
0948-1907

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## Abstract Lanthanum oxide (La~2~O~3~) films with good hemocompatibility and antibacterial properties have been fabricated using dual plasma deposition. X‐ray photoelectron spectroscopy (XPS) shows that La exists in the +3 oxidation state. The band gap of the materials is determined to be 3.6 eV.