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Passivation and interface state density of SiO[sub 2]/HfO[sub 2]-based/polycrystalline-Si gate stacks

✍ Scribed by Carter, R. J.; Cartier, E.; Kerber, A.; Pantisano, L.; Schram, T.; De Gendt, S.; Heyns, M.

Book ID: 126465933
Publisher: American Institute of Physics
Year: 2003
Tongue: English
Weight: 249 KB
Volume: 83
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.1592639

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