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Organosilicon thin films deposited by plasma enhanced CVD: Thermal changes of chemical structure and mechanical properties

✍ Scribed by L. Zajíčková; V. Buršíková; Z. Kučerová; J. Franclová; P. Sťahel; V. Peřina; A. Macková


Book ID
108191351
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
212 KB
Volume
68
Category
Article
ISSN
0022-3697

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