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Optical and electrical characterization of hafnium oxide deposited by liquid injection atomic layer deposition

✍ Scribed by P. Taechakumput; S. Taylor; O. Buiu; R.J. Potter; P.R. Chalker; A.C. Jones


Book ID
108210695
Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
428 KB
Volume
47
Category
Article
ISSN
0026-2714

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Optical and electrical characterization
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The paper reports on electrical and optical investigations performed on HfO 2 high-k films deposited by Metalorganic chemical vapor deposition (MOCVD). Spectroellipsometry investigations show the presence of a transition layer between HfO 2 and the silicon substrate, which can be optically modelled