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Composition–Structure–Dielectric Property of Yttrium-Doped Hafnium Oxide Films Deposited by Atomic Layer Deposition

✍ Scribed by Tao, Qian; Jursich, Gregory; Majumder, Prodyut; Singh, Manish; Walkosz, Weronika; Gu, Peter; Klie, Robert; Takoudis, Christos

No coin nor oath required. For personal study only.

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