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On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering

✍ Scribed by Alami, J; Sarakinos, K; Uslu, F; Wuttig, M


Book ID
120810723
Publisher
Institute of Physics
Year
2008
Tongue
English
Weight
1022 KB
Volume
42
Category
Article
ISSN
0022-3727

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In this work thin silver (Ag) films are grown employing high power pulsed magnetron sputtering (HPPMS) for various pulse on/off time configurations, as well as by dc magnetron sputtering (dcMS), for reference. It is shown that the increase of the pulse off-time from 450 ΞΌs to 3450 ΞΌs, while the puls