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The effects of substrate bias, substrate temperature, and pulse frequency on the microstructures of chromium nitride coatings deposited by pulsed direct current reactive magnetron sputtering

✍ Scribed by Jyh-Wei Lee; Shih-Kang Tien; Yu-Chu Kuo


Book ID
107453425
Publisher
Springer US
Year
2005
Tongue
English
Weight
721 KB
Volume
34
Category
Article
ISSN
0361-5235

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