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Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering

✍ Scribed by O. Zywitzki; G. Hoetzsch; F. Fietzke; K. Goedicke


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
685 KB
Volume
82
Category
Article
ISSN
0257-8972

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