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The effect of pulsed direct current substrate bias on the properties of titanium dioxide thin films deposited by filtered cathodic vacuum arc deposition

✍ Scribed by A. Bendavid; P.J. Martin; E.W. Preston

Book ID
108290132
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
406 KB
Volume
517
Category
Article
ISSN
0040-6090

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## Abstract High‐quality titanium nitride (TiN) films with nano‐structure were prepared at ambient temperature on (111) silicon substrates by filtered cathodic arc plasma (FCAP) technology with an in‐plane β€œS” filter. The effects of substrate bias and argon flux on the crystal grain size, roughness