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Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering

✍ Scribed by Qinghua Kong; Li Ji; Hongxuan Li; Xiaohong Liu; Yongjun Wang; Jianmin Chen; Huidi Zhou

Book ID: 108215822
Publisher: Elsevier Science
Year: 2011
Tongue: English
Weight: 521 KB
Volume: 176
Category: Article
ISSN: 0921-5107
DOI: 10.1016/j.mseb.2011.04.015

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