Influence of target-substrate distance and sputtering power on chromium oxide films prepared by medium-frequency magnetron sputtering

✍ Scribed by Huijuan Yang; Jun He; Canxin Tian; Chuansheng Liu; Dejun Fu

• Book ID: 107531538
• Publisher: Wuhan University
• Year: 2010
• Tongue: English
• Weight: 481 KB
• Volume: 15
• Category: Article
• ISSN: 1007-1202
• DOI: 10.1007/s11859-010-0680-0