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Reduction of residual stress for ZnO/Al thin films on glass substrate prepared by radio frequency magnetron sputtering

โœ Scribed by K Sakaguchi; S Iwasa; Y Yoshino


Book ID
108390467
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
409 KB
Volume
51
Category
Article
ISSN
0042-207X

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Improvement of thickness distribution an
โœ M Takeuchi; K Inoue; Y Yoshino; K Ohwada ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 358 KB

An improvement of thickness distribution and crystallinity in ZnO thin films prepared by radio frequency (rf) planer magnetron sputtering have been studied. Optimum thickness distribution of less than22.2% in a 3-inch wafer is obtained by changing the substrate angle to the ZnO target and is in acco